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Interposer having molded low CTE dielectric

机译:具有模制低CTE电介质的中介层

摘要

A method for making an interconnection component is disclosed, including forming a plurality of metal posts extending away from a reference surface. Each post is formed having a pair of opposed end surface and an edge surface extending therebetween. A dielectric layer is formed contacting the edge surfaces and filling spaces between adjacent ones of the posts. The dielectric layer has first and second opposed surfaces adjacent the first and second end surfaces. The dielectric layer has a coefficient of thermal expansion of less than 8 ppm/° C. The interconnection component is completed such that it has no interconnects between the first and second end surfaces of the posts that extend in a lateral direction. First and second pluralities of wettable contacts are adjacent the first and second opposed surfaces. The wettable contacts are usable to bond the interconnection component to a microelectronic element or a circuit panel.
机译:公开了一种用于制造互连部件的方法,该方法包括形成远离参考表面延伸的多个金属柱。每个柱形成为具有一对相对的端面和在其之间延伸的边缘表面。形成电介质层,其接触边缘表面并填充相邻的柱之间的空间。介电层具有与第一和第二端面相邻的第一和第二相对表面。介电层具有小于8ppm /℃的热膨胀系数。完成互连部件,使得其在横向延伸的柱的第一和第二端面之间没有互连。第一和第二多个可润湿触点与第一和第二相对表面相邻。可湿性触点可用于将互连部件结合到微电子元件或电路板上。

著录项

  • 公开/公告号US9406532B2

    专利类型

  • 公开/公告日2016-08-02

    原文格式PDF

  • 申请/专利权人 TESSERA INC.;

    申请/专利号US201414221486

  • 发明设计人 BELGACEM HABA;ILYAS MOHAMMED;

    申请日2014-03-21

  • 分类号H01L21/44;H01L21/48;H01L23/498;H05K3/40;

  • 国家 US

  • 入库时间 2022-08-21 14:29:38

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