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High energy ion implanter, beam current adjuster, and beam current adjustment method
High energy ion implanter, beam current adjuster, and beam current adjustment method
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机译:高能离子注入机,束流调节器和束流调节方法
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摘要
A beam current adjuster for an ion implanter includes a variable aperture device which is disposed at an ion beam focus point or a vicinity thereof. The variable aperture device is configured to adjust an ion beam width in a direction perpendicular to an ion beam focusing direction at the focus point in order to control an implanting beam current. The variable aperture device may be disposed immediately downstream of a mass analysis slit. The beam current adjuster may be provided with a high energy ion implanter including a high energy multistage linear acceleration unit.
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