Method for producing a high density plasma intended for in the process of coating a magnetron sputtering

摘要

method of manufacturing high density plasma intended for marking processes magnetronowego spraying coatings in a vacuum chamber, whereby discharge current density magnetronowych stimulate about 50 to 700 a / m2 using the sources pru0105dowych generating unidirectional ation ebiegi current of negative polarity in the gas atmosphere obru00f3bczej containing noble gas like argon, kryptonxenon or their mixture and reactive gas, like nitrogen or relationship alifatyczny containing in the molecule one or two carbon atoms, or their mixture, introduced into the chamber, is characterized by the fact that noble gas or a mixture of noble gases is given to the excited, i y simultaneous independent and continuous administration of a reactive gas or reactive gas mixtures.by maintaining the pressure inside the chamber not less than 0,4 bye. noble gas or a mixture of noble gases contain an impurity gas advantageously placed excited reactive.