COMPOUND, RESIN, AND METHOD FOR PURIFYING SAME, UNDERLAYER FILM FORMATION MATERIAL FOR LITHOGRAPHY, UNDERLAYER FILM FORMING COMPOSITION, AND UNDERLAYER FILM, AND METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING CIRCUIT PATTERN

摘要

The present invention provides a compound represented by formula (1). (In formula (1), R¹ represents a C1-30 2n-valent group, and R²-R⁵ each independently represent a C1-10 straight chain, branched, or cyclic alkyl group, a C6-10 aryl group, a C2-10 alkenyl group, a C1-30 alkoxy group, a halogen atom, a thiol group, or a hydroxyl group. However, at least one selected from R¹-R⁵ represents a group including an iodine atom, and at least one R⁴ and/or at least one R⁵ represents one or more species selected from the group consisting of a hydroxyl group and a thiol group. In the formula, m² and m³ each independently represents an integer of 0-8, and m⁴ and m⁵ each independently represents an integer of 0-9. However, m⁴ and m⁵ do not both represent 0 at the same time. In the formula, n represents an integer of 1-4, and p²-p⁵ each independently represents an integer of 0-2.)