COMPOUND, RESIN, LITHOGRAPHY UNDERLAYER FILM FORMING MATERIAL, LITHOGRAPHY UNDERLAYER FILM FORMING COMPOSITION, LITHOGRAPHY UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR PURIFYING COMPOUND OR RESIN

摘要

A compound represented by the following formula (1). (in formula (1), R 1 represents a 2n-valent group having 1 to 30 carbon atoms, R 2 to R 5 each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group or a hydroxyl group, provided that at least one R 4 and/or at least one R 5 represents an alkoxy group having 1 to 30 carbon atoms, m 2 and m 3 are each independently an integer of 0 to 8, m 4 and m 5 are each independently an integer of 0 to 9, provided that m 4 and m 5 are not 0 at the same time, n is an integer of 1 to 4, and p 2 to p 5 are each independently an integer of 0 to 2.)