COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN

摘要

A compound represented by the following formula (1).; ;(in formula (1), R¹ represents a 2n-valent group having 1 to 30 carbon atoms, R² to R⁵ each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group or a hydroxyl group, provided that at least one R⁴ and/or at least one R⁵ represents an alkoxy group having 1 to 30 carbon atoms, m² and m³ are each independently an integer of 0 to 8, m⁴ and m⁵ are each independently an integer of 0 to 9, provided that m⁴ and m⁵ are not 0 at the same time, n is an integer of 1 to 4, and p² to p⁵ are each independently an integer of 0 to 2.)