VAPOR DEPOSITION DEPOSITED PHOTORESIST, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR

摘要

A photoresist vapor deposition system comprising: a vacuum chamber having a chuck and a heating element to be cooled to hold a substrate; a vacuum chamber having an inlet to be heated; And a vapor deposition system connected to the heated inlet for volatilizing the precursor into the vacuum chamber to condense the photoresist onto the substrate cooled by the chuck to be cooled. The deposition system creates a semiconductor wafer system, wherein the semiconductor wafer system comprises: a semiconductor wafer; And a photoresist vapor deposited on the semiconductor wafer. An extreme ultraviolet lithography system requiring a semiconductor wafer system comprises: an extreme ultraviolet light source; A mirror for directing light from an extreme ultraviolet light source; A reticle stage for imaging light from an extreme ultraviolet light source; And a wafer stage for placing a semiconductor wafer having a photoresist vapor-deposited thereon.