Vacuum-vapor-deposited thin films of benzoaphenoxazone-5 derivatives as photoresist layers: properties versus deposition parameters

摘要

Abstract: The phisico-chemical properties of the benzo $LB@a$RB phenoxazone-5 derivatives and their vacuum-deposited thin films (optical absorption, phase and chemical compositions, free surface energies of the films, and their supermolecular structures) have been studied. Changes in the vapor phase ratio of the dye derivatives have been investigated dependent on the boat-evaporator temperature, and chemical structures of the transformation products have been established. The films of different structure phase states have been obtained dependent on the formation conditions. Thin films of 9-diethylamino-3- methacryloyloxy-5H-benzo $LB@a$RB phenoxaz-5-dicyanmethylene display good light-sensitive and masking properties and are suitable for submicron patterning under UV-exposure with $lambda $EQ 266 nm. !7