首页> 外国专利> RESISTIVE RANDOM ACCESS MEMORY DEVICE HAVING NANOSCALE TIP, MEMORY ARRAY USING SAME AND FABRICATION METHOD THEREOF

RESISTIVE RANDOM ACCESS MEMORY DEVICE HAVING NANOSCALE TIP, MEMORY ARRAY USING SAME AND FABRICATION METHOD THEREOF

机译:具有纳米尺度提示的电阻式随机存取存储器,使用相同的存储器阵列及其制造方法

摘要

The present invention relates to a resistive random access memory device having a nanoscale tip with high compatibility with an existing semiconductor process, a memory array using the same and a fabrication method thereof. A lower electrode having a protruding tip structure in a cone shape is formed by etching a semiconductor substrate. Therefore, the present invention provides technology for localizing a region for forming a conductive filament by focusing an electric field on the lower electrode intersecting with an upper electrode. The resistive random access memory device comprises a lower electrode; an interlayer insulating layer; a resistance change layer; and an upper electrode.;COPYRIGHT KIPO 2016
机译:具有纳米级尖端的电阻型随机存取存储装置及其制造方法技术领域本发明涉及一种具有与现有的半导体工艺高度相容的纳米级尖端的电阻型随机存取存储装置,使用其的存储阵列及其制造方法。通过蚀刻半导体基板来形成具有圆锥状的顶端结构的下部电极。因此,本发明提供了一种技术,该技术通过将电场聚焦在与上电极相交的下电极上来定位用于形成导电丝的区域。电阻式随机存取存储装置包括下部电极;以及下部电极。层间绝缘层;电阻变化层;和上电极。; COPYRIGHT KIPO 2016

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