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PREPARATION METHOD OF TUNGSTEN SPUTTERING TARGET AND TUNGSTEN SPUTTERING TARGET PREPARED THEREOF
PREPARATION METHOD OF TUNGSTEN SPUTTERING TARGET AND TUNGSTEN SPUTTERING TARGET PREPARED THEREOF
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机译:钨溅射靶的制备方法及其制备的钨溅射靶
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摘要
The present invention relates to a preparation method of a tungsten sputtering target. The preparation method of the tungsten sputtering target comprises: (a) a step of forming a green compact with tungsten powder; (b) a step of cold isostatically pressing the green compact; (c) a step of heat-treating the cold isostatically pressed green compact under vacuum; and (d) a step of hot isostatically pressing the heat treated green compact under vacuum. The tungsten sputtering target has fine crystal grains, a high density, and a high purity.;COPYRIGHT KIPO 2016
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