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PREPARATION METHOD OF TUNGSTEN SPUTTERING TARGET AND TUNGSTEN SPUTTERING TARGET PREPARED THEREOF

机译:钨溅射靶的制备方法及其制备的钨溅射靶

摘要

The present invention relates to a preparation method of a tungsten sputtering target. The preparation method of the tungsten sputtering target comprises: (a) a step of forming a green compact with tungsten powder; (b) a step of cold isostatically pressing the green compact; (c) a step of heat-treating the cold isostatically pressed green compact under vacuum; and (d) a step of hot isostatically pressing the heat treated green compact under vacuum. The tungsten sputtering target has fine crystal grains, a high density, and a high purity.;COPYRIGHT KIPO 2016
机译:钨溅射靶的制备方法技术领域本发明涉及钨溅射靶的制备方法。钨溅射靶的制备方法包括:(a)用钨粉形成生坯的步骤; (b)冷等静压生坯的步骤; (c)在真空下对冷等静压的生压坯进行热处理的步骤; (d)在真空下对被热处理的生压坯进行热等静压的步骤。钨溅射靶具有细小的晶粒,高密度和高纯度。; COPYRIGHT KIPO 2016

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