PREPARATION METHOD OF TUNGSTEN SPUTTERING TARGET AND TUNGSTEN SPUTTERING TARGET PREPARED THEREBY

摘要

The present invention relates to a preparation method of a tungsten sputtering target and a tungsten sputtering target prepared thereby, wherein the method comprises the following steps of: forming round tungsten powder by heat plasma treating non-round tungsten powder; forming an object to be molded by molding the round tungsten powder; forming a first sintering object by heat treating the object to be molded under a vacuum atmosphere; and hot isostatic pressing sintering the first sintering object.;COPYRIGHT KIPO 2016