semiconductor wafer cleaning apparatus having brush assembly

摘要

A semiconductor cleaning apparatus according to the present invention comprises a brush assembly rotating in contact with a surface of a semiconductor wafer, and a chemical solution supply unit for supplying a chemical solution into the brush assembly. The brush assembly includes a brush body having a first inner hollow body, a brush formed on an outer peripheral surface of the brush body and having a support projection formed on an inner peripheral surface of the brush body and a brush projection contacting the surface of the semiconductor wafer, A brush holder having a holder body having a second inner hollow and a through body having an inner circumferential surface and an outer circumferential surface of the holder body, the holder body being inserted into the first inner hollow of the brush body so that the through- A core body inserted into the second inner hollow, a brush core provided inside the core body and having an inner liquid discharge pipe connected to the inner liquid supply pipe and an inner liquid supply pipe through which the liquid is supplied from the liquid supply portion and the brush assembly, A chemical liquid discharging portion for discharging the chemical liquid supplied inside is connected .