conduct vapor phase growth apparatus of the type, the reaction chamber and, disposed in the upper portion of the reaction chamber, a plurality of first transverse gas flow path arranged in a first horizontal plane and parallel to the stretching to each other, the first disposed in the first plurality of longitudinal gas flow channel and a second horizontal plane above the first horizontal surface connected to a lateral gas flow path and extends in the longitudinal direction and having a first gas vent in the reaction is measured and the first transverse gas flow path and a plurality of second transverse gas flow path parallel to the stretching to each other in the same direction, a second connection to a lateral gas flow path and the first transverse direction pass between the gas flow path by stretching in the longitudinal direction and the second gas jet in the reaction is measured a plurality of second longitudinal gas flow path having a ball, and a shower plate for supplying a gas in a reaction chamber, is formed in the lower side the shower plate in the reaction chamber, and a support part that can be mounted to the substrate. ;
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