SUBSTRATE PROCESSING APPARATUS SUBSTRATE TRANSFER METHOD ABNORMAL TREATMENT UNIT DETERMINING METHOD AND COMPUTER STORAGE MEDIUM

摘要

The presence or absence of abnormality of the processing section is judged in real time, and a large number of rejected wafers are prevented from being produced. The coating and developing apparatus includes a wafer transport mechanism, a defect inspection portion, a transport control means (200) for controlling the transport of the wafer, defect classification means (203) for classifying the defect based on the defect state, A storage means 202 for storing the wafer transfer route by the wafer transfer mechanism when the wafer is processed by the defect sorting means 203 and the type of defect classified by the defect sorting means 203, And a defect processing specifying means for determining the presence or absence of an abnormality in a processing section specified as having occurred a defect, wherein the defect management processing means The control unit 200 controls the wafer transfer mechanism to transfer the wafer by bypassing the processing unit determined to be abnormal by the defect processing specifying means 204. [