A method of fabricating a substrate patterned with nanowires, fabricated substrate, and using the substrate

摘要

According to the present invention, there is provided a method of making a nanowire patterned substrate characterized in that no lubricant and no lithographic resist mask is used in the method and only by moving a donor substrate with nanowires relative to a substrate and locally different tribological properties on the substrate Surface of the substrate is selectively deposited at locally defined locations of the substrate a certain number of nanowires. In addition, a substrate is provided which can be produced by the method according to the invention and contains a specific number of nanowires selectively on a surface at locally defined locations. Furthermore, the use of the substrate according to the invention in microelectronics, microsystem technology and / or microsensorics is proposed.