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FABRICATING METHOD OF PATTERNED SUBSTRATE AND FABRICATING METHOD OF LIGHT EMITTING DIODE OF USING THE SUBSTRATE
FABRICATING METHOD OF PATTERNED SUBSTRATE AND FABRICATING METHOD OF LIGHT EMITTING DIODE OF USING THE SUBSTRATE
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机译:图案化基质的制备方法和使用该基质的发光二极管的制备方法
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摘要
The present invention relates to a method of manufacturing a light emitting diode using the manufacturing method and the substrate of the patterned substrate , by using a nano powder is formed on the substrate after the pattern of the nanoscale, and growing a nitride semiconductor layer, to form a pattern of nano-scale on the surface of the nitride semiconductor layer is characterized in that raised the critical angle. ; According to the present invention, by forming the pattern of the nano-scale to the substrate, the potential in the nitride-based semiconductor layer grown on the substrate (Dislocation) or defects (Defect), etc. it is possible to reduce the gain of the high-quality nitride-based semiconductor crystalline number, and by giving the surface of the nitride semiconductor layer of the light emitting diode to form a pattern of nano-scale increase the critical angle of the surface, the light generated in the active layer reaches the nitride semiconductor layer, reducing the likelihood that consumption is again totally reflected by the inner element is able to line it is possible to improve the light extraction efficiency of the LED.
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