Durable metal film deposition to the mask repair

摘要

Disclosed are methods and tools for repairing a provided in accordance with. The method comprises the steps of positioning the wafer in a repair chamber, which comprises a repair tool, of the feeding of a first gas and a second gas chamber in the repair. The first gas comprises a repair material to repair a defect on the mask, and the second gas comprises a polar gas and contributes to the deposition of the repair material, on the wafer in the case of. The method further comprises the steps of activating of the repair tool, so that the repair tool with the first and second gases interacts, in order to the repair material at the point of the defect, in order to repair the wafer, and of the withdrawal of the repaired wafer from the repair chamber. A dimension of the deposited repair material, is less than about 32 nanometers.