首页> 外国专利> Brief description of the charges of crystals of hexanitrohexaazaisowurtzitane (cl20) of monomodal submicronic particle size, said fillers and their use as fillers for seeding

Brief description of the charges of crystals of hexanitrohexaazaisowurtzitane (cl20) of monomodal submicronic particle size, said fillers and their use as fillers for seeding

机译:简述单峰亚微米粒度的六硝基六氮杂异纤锌矿型结构烷烃(cl20)晶体的电荷,所述填料及其作为种子填料的用途

摘要

The present invention relates to a process for the production of charges (energy) of crystals of hexanitrohexaazaisowurtzitane (cl20 or hniw) of monomodal submicronic particle size (d50 ≦ 1 μm) as well as the charges, which is novel per se, which can be obtained by said process. It also relates to the use of said fillers to inoculate saturated solutions of cl20 in order to obtain crystals of cl20 of small size. The process in question comprises continuous grinding of a load of crystals of hexanitrohexaazaisowurtzitane, of particle size at - addition of a micron (d50 1 μm), in suspension in a liquid, the said grinding being used, with cooling, for multi - passages of the suspension (1) in a mill (20) to flow, with a horizontal axis, to abrasion, with the grinding media (9) agitated.
机译:本发明涉及产生单峰亚微米粒度(d50≤1μm)的六硝基六氮杂异纤锌矿型结构烷烃(cl20或hniw)晶体的电荷(能量)的方法以及该电荷本身是新颖的。通过所述过程获得。它还涉及所述填料用于接种cl20的饱和溶液以获得小尺寸cl20的晶体的用途。所讨论的方法包括以液体形式连续研磨六硝基六氮杂氮杂异纤锌矿型结构烷烃的粒径为-加入微米(d50> 1μm)的颗粒,该粉末在冷却下用于多道次悬浮液(1)在研磨机(20)中的流动,使其在水平轴线上流动,并在搅拌研磨介质(9)的情况下磨损。

著录项

  • 公开/公告号FR3018807B1

    专利类型

  • 公开/公告日2016-04-15

    原文格式PDF

  • 申请/专利权人 HERAKLES;EURENCO;

    申请/专利号FR20140000669

  • 发明设计人 ANGELINE AUMELAS;PHILIPPE LESCOP;

    申请日2014-03-20

  • 分类号C06B21/00;C06B25/34;B02C17/16;B02C23/18;

  • 国家 FR

  • 入库时间 2022-08-21 14:08:39

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