首页> 外国专利> PROCESS FOR OBTAINING SUBMICRON MONOMODAL GRANULOMETRY HEXANITROHEXAAZAISOWURTZITANE CRYSTAL (CL20) CHARGES, THE SAME CHARGES AND THEIR USE AS SEEDING LOADS

PROCESS FOR OBTAINING SUBMICRON MONOMODAL GRANULOMETRY HEXANITROHEXAAZAISOWURTZITANE CRYSTAL (CL20) CHARGES, THE SAME CHARGES AND THEIR USE AS SEEDING LOADS

机译:获得亚微米单峰粒度测定法六方六方正庚烷异戊二烯晶体(CL20)电荷,相同的电荷及其在分担载荷中的使用

摘要

The subject of the present invention is a process for obtaining (energy) charges of hexanitrohexaazaisowurtzitane (CL20 or HNIW) crystals of monomodal submicron granulometry (D50 1 μm), as well as the charges, which are, by themselves, likely to be d obtained by said method. It also relates to the use of said charges to seed solutions saturated with CL20 in order to obtain small crystals of CL20. The process involves continuously grinding a charge of hexanitrohexaazaisowurtzitane crystals with a particle size above the micron (D50 1 μm) suspended in a liquid; said grinding being carried out, with cooling, by multi-passage of the suspension (1) in a grinder (20) circulation, horizontal axis, attrition with grinding media (9) agitated.
机译:本发明的主题是一种用于获得(能量)单峰亚微米粒度(D50 <1μm)的六硝基六氮杂异纤锌矿型结构烷烃(CL20或HNIW)晶体的电荷(能量),以及它们本身很可能是d的电荷的方法。通过所述方法获得。它还涉及将所述电荷用于用CL20饱和的种子溶液中以获得CL20的小晶体的用途。该方法包括连续研磨装在颗粒中的六硝基六氮杂异纤锌矿型结构烷烃晶体,其粒径大于悬浮在液体中的微米(D50> 1μm)。所述研磨是在冷却下,通过使悬浮液(1)在研磨机(20)循环中多次通过,在水平轴上进行,并在搅拌的研磨介质(9)的作用下进行的。

著录项

  • 公开/公告号FR3018807A1

    专利类型

  • 公开/公告日2015-09-25

    原文格式PDF

  • 申请/专利权人 HERAKLES;EURENCO;

    申请/专利号FR20140000669

  • 发明设计人 ANGELINE AUMELAS;PHILIPPE LESCOP;

    申请日2014-03-20

  • 分类号C06B21;B02C17/16;B02C23/18;C06B25/34;

  • 国家 FR

  • 入库时间 2022-08-21 14:54:08

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