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ELECTROLYTE AND METHOD FOR ELECTROLYTIC DEPOSITION OF GOLD-COPPER ALLOYS

机译:电解和金铜合金的电解沉积方法

摘要

This invention relates to an electrolyte as well as a method for the deposition of a gold-copper alloy on a substrate surface. With the electrolyte and method disclosed, deposition of gold-copper alloys with a value of carat in the range of 12 to 19 kt is possible. Beneath a source of gold and copper, the inventive electrolyte comprises potassium cyanate (KCN) in a concentration capable to maintain a copper to KCN ratio in the range of 3 to 7, and at least one complexing agent of the group consisting of ethylenediamine tetraacetic acid, diethylenetriamine pentaacetic acid, nitrilo-triacetic acid, ethylenediamine tetraacetic acid [EDTA], diethylenetriamine pentaacetic acid and nitrilo-triacetic acid [NTA] Hydroxyethyl imino diacetic acid [HEIDA], nitrilo propionic diacetic acid [NPDA], imino diacetic acid [IDA], nitrilo trimethylphosphoric acid [NTMA, Dequest 2000], triethanol amine [TEA].
机译:本发明涉及一种电解质以及在基底表面上沉积金铜合金的方法。利用所公开的电解质和方法,可以沉积克拉值在12到19 kt范围内的金铜合金。在金和铜的来源下,本发明的电解质包含能够将铜与KCN之比保持在3至7范围内的浓度的氰酸钾(KCN),以及由乙二胺四乙酸组成的组中的至少一种络合剂。 ,二亚乙基三胺五乙酸,次氮基三乙酸,乙二胺四乙酸[EDTA],二亚乙基三胺五乙酸和次氮基三乙酸[NTA]羟乙基亚氨基二乙酸[HEIDA],次氮基丙酸二乙酸[NPDA],亚氨基二乙酸[IDA] ,次氮基三甲基磷酸[NTMA,Dequest 2000],三乙醇胺[TEA]。

著录项

  • 公开/公告号EP1983077B1

    专利类型

  • 公开/公告日2016-12-28

    原文格式PDF

  • 申请/专利权人 ENTHONE;

    申请/专利号EP20070007963

  • 发明设计人 DESTHOMAS GUY;

    申请日2007-04-19

  • 分类号C25D3/58;C25D3/62;

  • 国家 EP

  • 入库时间 2022-08-21 14:06:06

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