首页> 外国专利> CRYSTALLIZATION OF ADDITIVES AT P/N JUNCTIONS OF BULK-HETEROJUNCTION PHOTOACTIVE LAYERS

CRYSTALLIZATION OF ADDITIVES AT P/N JUNCTIONS OF BULK-HETEROJUNCTION PHOTOACTIVE LAYERS

机译:本体-异质结光活性层P / N结处的添加剂的晶化

摘要

Disclosed is a method for making a bulk-heterojunction photoactive layer, positioning an additive at an interface of a bulk-heterojunction photoactive layer, or enhancing the efficiency of a bulk-heterojunction photoactive layer, the method comprising obtaining a mixture comprising a solvent, an electron donor material, an electron acceptable material, and an additive solubilized in the solvent, wherein the additive has a high (negative) enthalpy of crystalization (ΔHcryst), and forming a bulk-heterojunction photoactive layer from the mixture, wherein crystals of the additive are formed and positioned at an interface between the electron donor material and the electron acceptor material of the bulk-heterojunction photoactive layer.
机译:本发明公开了一种制造体相异质结光敏层,将添加剂置于体相异质结光敏层的界面处或提高体相异质结光敏层的效率的方法,该方法包括获得包含溶剂,电子给体材料,电子可接受材料和可溶于溶剂的添加剂,其中添加剂具有高(负)结晶焓(ΔHcryst),并由该混合物形成体-异质结光敏层,其中添加剂的晶体在体-异质结光敏层的电子供体材料和电子受体材料之间的界面处形成并定位有电子。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号