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Raman study of bulk-heterojunction morphology in photoactive layers treated with solvent-vapor annealing

机译:溶剂-蒸气退火处理的光敏层中体-异质结形态的拉曼研究

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摘要

The effect of solvent-vapor annealing (SVA) on bulk-heterojunction morphology in photoactive layers composed of poly(3-hexylthiophene-2,5-diyl) (P3HT) and [6,6]-phenyl-C-61-butyric acid methyl ester (PCBM) was analyzed using Raman spectroscopy. We prepared the photoactive layers by electrostatic spray deposition (ESD) and fabricated organic photovoltaic devices with a conventional cell structure. Although postdeposition annealing can be omitted when the photoactive layer is deposited using ESD under dry condition, the surface is relatively rough owing to the existence of a number of droplet traces. The SVA treatment can eliminate such droplet traces, while excessive SVA resulted in a significant decrease in open-circuit voltage. The Raman study of the bulk-heterojunction morphology demonstrated the accumulation of P3HT molecules on the surface during SVA, which induced the recombination of photogenerated charges at the interface of the cathode/photoactive layer and thereby decreased the open-circuit voltage. (C) 2018 The Japan Society of Applied Physics
机译:溶剂-蒸气退火(SVA)对聚(3-己基噻吩-2,5-二基)(P3HT)和[6,6]-苯基-C-61-丁酸组成的光敏层中本体异质结形态的影响使用拉曼光谱分析甲酯(PCBM)。我们通过静电喷涂(ESD)制备了光敏层,并制造了具有常规电池结构的有机光伏器件。尽管在干燥条件下使用ESD沉积光敏层时可以省去沉积后退火,但由于存在许多液滴痕迹,因此表面相对较粗糙。 SVA处理可以消除此类液滴痕迹,而过量的SVA则导致开路电压显着降低。拉曼研究的本体-异质结形态学表明,在SVA期间P3HT分子在表面上积累,这引起了阴极/光敏层界面处光生电荷的复合,从而降低了开路电压。 (C)2018日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2018年第3s2期|03EG01.1-03EG01.4|共4页
  • 作者单位

    Univ Yamanashi, Dept Elect & Elect Engn, Kofu, Yamanashi 4008511, Japan;

    Univ Yamanashi, Dept Elect & Elect Engn, Kofu, Yamanashi 4008511, Japan;

    Univ Yamanashi, Dept Elect & Elect Engn, Kofu, Yamanashi 4008511, Japan;

    Univ Yamanashi, Dept Elect & Elect Engn, Kofu, Yamanashi 4008511, Japan;

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