首页> 外国专利> MANUFACTURING METHOD OF GALLIUM NITRIDE CRYSTAL, GALLIUM NITRIDE CRYSTAL, AND GALLIUM NITRIDE CRYSTAL SUBSTRATE

MANUFACTURING METHOD OF GALLIUM NITRIDE CRYSTAL, GALLIUM NITRIDE CRYSTAL, AND GALLIUM NITRIDE CRYSTAL SUBSTRATE

机译:氮化镓晶体,氮化镓晶体和氮化镓晶体基质的制造方法

摘要

PROBLEM TO BE SOLVED: To achieve low stress distribution of a grown gallium nitride crystal.;SOLUTION: A manufacturing method of a gallium nitride crystal includes a preparation step for preparing a columnar first gallium nitride crystal having a lattice constant of (a)axial length less than 0.3189 nm, and a growth step for growing a second gallium nitride crystal around the first gallium nitride crystal. The first gallium nitride crystal preferably has a lattice constant of (c)axial length less than 0.5170 nm. The preparation step includes a first step for manufacturing one or more gallium nitride crystals by a flux method and a second step for selecting the first gallium nitride crystal from the one or more gallium nitride crystals.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2017,JPO&INPIT
机译:解决的问题:为了获得生长的氮化镓晶体的低应力分布;解决方案:氮化镓晶体的制造方法包括制备步骤,该制备步骤用于制备具有(a)轴向长度的晶格常数的柱状第一氮化镓晶体。小于0.3189nm,以及用于在第一氮化镓晶体周围生长第二氮化镓晶体的生长步骤。第一氮化镓晶体优选具有(c)轴向长度小于0.5170nm的晶格常数。制备步骤包括通过熔剂法制造一个或多个氮化镓晶体的第一步和从一个或多个氮化镓晶体中选择第一个氮化镓晶体的第二步。;选定的附图:图1;版权:(C )2017,JPO&INPIT

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号