首页> 外国专利> POLYMER FILM FOR ANALYZER, SUBSTRATE FOR ANALYZER, METHOD OF MANUFACTURING POLYMER FILM FOR ANALYZER, AND METHOD OF MANUFACTURING SUBSTRATE FOR ANALYZER

POLYMER FILM FOR ANALYZER, SUBSTRATE FOR ANALYZER, METHOD OF MANUFACTURING POLYMER FILM FOR ANALYZER, AND METHOD OF MANUFACTURING SUBSTRATE FOR ANALYZER

机译:用于分析器的聚合物膜,用于分析器的基质,用于分析器的聚合物膜的制造方法以及用于分析器的基质的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a polymer film that can be used separately from a substrate, such as an Si substrate, and reduces distortion of nanopore openings.SOLUTION: A polymer film for an analyzer comprises a polymer film (11) having a nanopore (12) formed therethrough. The nanopore (12) has openings (12a, 12b) provided at surfaces (11a, 11b) of the polymer film (11), and an inner wall (12c) formed through the polymer film (11) between the openings (12a, 12b). A ratio of a diameter of a maximum circle (13) to a diameter of a minimum circle (14) of the openings (12a, 12b) is 1.274 or less.SELECTED DRAWING: Figure 1
机译:解决的问题:提供一种可与基板(例如Si基板)分开使用并减少纳米孔开口变形的聚合物膜。解决方案:用于分析仪的聚合物膜包括具有纳米孔的聚合物膜(11) (12)由此形成。纳米孔(12)具有设置在聚合物膜(11)的表面(11a,11b)上的开口(12a,12b),以及在开口(12a,12b)之间穿过聚合物膜(11)形成的内壁(12c)。 )。开口(12a,12b)的最大圆(13)的直径与最小圆(14)的直径之比为1.274或更小。

著录项

  • 公开/公告号JP2017187443A

    专利类型

  • 公开/公告日2017-10-12

    原文格式PDF

  • 申请/专利权人 TOWA CORP;

    申请/专利号JP20160078015

  • 发明设计人 FUJITA YUJI;AMAYA SATOSHI;

    申请日2016-04-08

  • 分类号G01N27;C12M1/12;

  • 国家 JP

  • 入库时间 2022-08-21 14:01:44

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