POLYMER FOR FORMING RESIST UNDERLAY FILM AND PRODUCTION METHOD THEREOF, COMPOSITION FOR FORMING RESIST UNDERLAY FILM, RESIST UNDERLAY FILM, AND METHOD FOR MANUFACTURING PATTERNED SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide: a polymer for forming a resist underlay film which allows use of PGMEA or the like as a solvent and enables formation of a resist underlay film excellent in edge rinsing property, solvent resistance, etching resistance, heat resistance and filling property; and a composition for forming a resist underlay film.;SOLUTION: The polymer for forming a resist underlay film has a first repeating unit represented by formula (1) below. In formula (1), Ar¹, Ar² and Ar³ each independently represent a substituted or unsubstituted arenediyl group having 6 to 30 carbon atoms; R¹ represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms; n represents 0 or 1; R² represents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms; R³ represents a substituted or unsubstituted monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms; and R⁴ represents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 30 carbon atoms.;SELECTED DRAWING: None;COPYRIGHT: (C)2017,JPO&INPIT