An exposure mask manufacturing method, an exposure method using an exposure mask, a reference mask used for manufacturing an exposure mask, and an exposure mask

摘要

PROBLEM TO BE SOLVED: To provide a method of producing an exposure mask which enables easy acquisition of an exposure mask allowing exposure of a to-be-exposed object with high position accuracy.SOLUTION: A reference to-be-exposed object is irradiated with exposure light by using a reference mask which can direct the exposure light to the same block as that for an exposure mask and has a plurality of openings arranged regularly, and exposure points formed practically on the reference to-be-exposed object in correspondence with the openings of the reference masks are recorded as measurement points. Design exposure points which are formed on a to-be-exposed surface (target surface) by the exposure light passing through the openings of the reference mask are calculated as design points. An exposure pattern on the target surface is corrected on the basis of the deviation between the design points and the measurement points to create a corrected exposure pattern. Then, an exposure mask which is so designed as to carry out irradiation of the target surface with the exposure light in the corrected exposure pattern is produced.