首页> 外国专利> Method for manufacturing -Ga 2 O 3 single crystal layer, sapphire substrate with -Ga 2 O 3 single crystal layer, -Ga 2 O 3 free-standing single crystal and method for producing the same

Method for manufacturing -Ga 2 O 3 single crystal layer, sapphire substrate with -Ga 2 O 3 single crystal layer, -Ga 2 O 3 free-standing single crystal and method for producing the same

机译:-Ga 2 O 3单晶层的制造方法,具有-Ga 2 O 3单晶层的蓝宝石基板,-Ga 2 O 3自立单晶及其制造方法

摘要

Easy and inexpensive -Ga2O3Method for producing single crystal layer and -Ga2O3A sapphire substrate with a single crystal layer, -Ga2O3And to provide a method for manufacturing the self-supporting single crystal plate. -Ga2O3By using a single crystal substrate having an atomic arrangement similarity to a surface on which a crystal is epitaxially grown but having a surface having no rotational symmetry, a -Ga2O3And forming a single crystal layer on the substrate2O3The above problem can be solved by using a method of manufacturing a single crystal layer. In addition, -Ga2O3Sapphire substrate with monocrystalline layer and -Ga2O3Free-standing single crystal and a method for producing them.
机译:简单且便宜的-Ga 2 O 3 生产单晶层和-Ga 2 O 3 蓝宝石的方法具有单晶层-Ga 2 O 3 的衬底,并提供一种制造自支撑单晶板的方法。 -Ga 2 O 3 通过使用具有与在其上外延生长晶体的表面相似的原子排列但具有无旋转对称性的表面的原子排列的单晶衬底, -Ga 2 O 3 并在衬底 2 O 3 上形成单晶层上述问题可能是通过使用制造单晶层的方法解决。此外,具有单晶层的-Ga 2 O 3 蓝宝石衬底和-Ga 2 O 3 自立式单晶及其制造方法。

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