Method of manufacturing susceptor for wafer placement and susceptor for wafer placement

摘要

PROBLEM TO BE SOLVED: To provide: a method for manufacturing a susceptor for holding a wafer, which is capable of keeping silicon carbide crystal exposed from a surface even under a use environment such that the silicon carbide is gradually etched, and capable of maintaining a slip-suppressing function for a long term; and such a susceptor for holding a wafer.SOLUTION: In a method for manufacturing a susceptor for holding a wafer, which is composed of a silicon carbide sintered compact produced by sintering a compact of silicon carbide powder, mixed silicon carbide powder 16 includes: silicon carbide fine powder 12 having an average particle diameter of 0.05-5 μm; and silicon carbide coarse powder 14 having an average particle diameter of 10-50 μm.