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Measurement method by X-ray diffraction measurement apparatus, and x-ray diffraction measurement device

机译:X射线衍射测定装置的测定方法以及x射线衍射测定装置

摘要

PROBLEM TO BE SOLVED: To provide the characteristic value of an object to be measured from a formed diffraction ring with high accuracy, even when the amount of the object to be measured is minute.SOLUTION: An X-ray incidence angle relative to an object to be measured is adjusted, and a diffraction ring is formed for each of a plurality of incidence angles, and detection is made of its shape. Data based on the shape of the detected diffraction ring is created, and the data is corrected by the corresponding X-ray incidence angle and a preset X-ray incidence angle. The corrected data for each of the plurality of incidence angles are put together as one data group, and the characteristic value of the object to be measured is calculated.
机译:解决的问题:即使在被测物体的量很小的情况下,也要从形成的衍射环上高精度地提供被测物体的特征值。解决方案:相对于物体的X射线入射角调节被测物,并针对多个入射角分别形成衍射环,并对其形状进行检测。创建基于检测到的衍射环的形状的数据,并通过相应的X射线入射角和预设的X射线入射角对数据进行校正。将针对多个入射角中的每个入射角的校正数据汇总为一个数据组,并计算出被测物的特性值。

著录项

  • 公开/公告号JP6037237B2

    专利类型

  • 公开/公告日2016-12-07

    原文格式PDF

  • 申请/专利权人 パルステック工業株式会社;

    申请/专利号JP20140019106

  • 发明设计人 丸山 洋一;

    申请日2014-02-04

  • 分类号G01N23/205;

  • 国家 JP

  • 入库时间 2022-08-21 13:53:03

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