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Power trench MOSFET with improved unclamped inductive switching (UIS) performance and preparation method thereof

机译:具有改善的非钳位电感开关性能的功率沟槽MOSFET及其制备方法

摘要

A trench type power semiconductor device with improved breakdown voltage and UIS performance and a method for preparation the device are disclosed. The trench type power semiconductor device includes a first contact hole formed in a mesa in the active area and a second contact hole formed in a mesa in an active to termination intermediate area, where the first contact hole is deeper and wider than the second contact hole.
机译:公开了一种具有改善的击穿电压和UIS性能的沟槽型功率半导体器件及其制备方法。沟槽型功率半导体器件包括在有源区域的台面中形成的第一接触孔和在有源至终止中间区域的台面中形成的第二接触孔,其中第一接触孔比第二接触孔更深和更宽。 。

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