首页> 外国专利> METHOD FOR EVALUATING WARPAGE OF WAFER AND METHOD FOR SORTING WAFER

METHOD FOR EVALUATING WARPAGE OF WAFER AND METHOD FOR SORTING WAFER

机译:晶圆翘曲评估方法及晶圆排序方法

摘要

A method for evaluating warpage of a wafer, includes measuring the warpage of the wafer that is in a free state without suction and determining, from measured warpage data, a wafer warpage amount A between two points Q1 and Q2 and a wafer warpage amount B between two points R1 and R2, the points Q1 and Q2 being located on a straight line passing through an arbitrary point P in a wafer plane and a distance “a” away from the point P, the points R1 and R2 being located on the same straight line and a distance “b” away from the point P, the distance “b” differing from the distance “a”, calculating, from the wafer warpage amount A and the wafer warpage amount B, a difference in wafer warpage amount at the point P, and evaluating the warpage on the basis of the difference in wafer warpage amount.
机译:一种评估晶片翘曲的方法,包括测量处于自由状态且无抽吸的晶片的翘曲,并根据测得的翘曲数据确定两点Q 1 和Q 2 和两个点R 1 和R 2 ,点Q 1 和之间的晶圆翘曲量B Q 2 位于通过晶片平面中任意点P且与点P,点R 1 和R相距距离“ a”的直线上 2 位于同一条直线上,并且与点P的距离为“ b”,距离“ b”与距离“ a”不同,根据晶片翘曲量A和晶片翘曲量B,在点P处的晶片翘曲量之差,并基于晶片翘曲量之差评估翘曲。

著录项

  • 公开/公告号US2017038202A1

    专利类型

  • 公开/公告日2017-02-09

    原文格式PDF

  • 申请/专利权人 SHIN-ETSU HANDOTAI CO. LTD.;

    申请/专利号US201515305222

  • 发明设计人 HISAYUKI SAITO;

    申请日2015-03-12

  • 分类号G01B21/20;

  • 国家 US

  • 入库时间 2022-08-21 13:45:01

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号