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Method of fabricating sputtering target, sputtering target using the method, and method of manufacturing organic light-emitting display apparatus using the sputtering target

机译:溅射靶的制造方法,使用该靶的溅射靶以及使用该溅射靶的有机发光显示装置的制造方法

摘要

A method of fabricating a sputtering target includes preparing a first powder material including at least one of a tin oxide and a mesh-forming oxide; mixing the first powder material and a second powder material comprising carbon or a tin oxide to prepare a mixture; simultaneously performing a primary compression and primary sintering on the mixture in a reduction atmosphere; and simultaneously performing a secondary compression and secondary sintering on the mixture in the reduction atmosphere to prepare the sputtering target.
机译:一种制造溅射靶的方法,包括:制备第一粉末材料,该第一粉末材料包括氧化锡和网状形成氧化物中的至少一种;和将第一粉末材料和包含碳或氧化锡的第二粉末材料混合以制备混合物;在还原气氛中同时对混合物进行一次压缩和一次烧结;同时在还原气氛中对该混合物进行二次压缩和二次烧结以制备溅射靶。

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