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CMOS compatible ultraviolet sensor device and method of producing a CMOS compatible ultraviolet sensor device

机译:CMOS兼容的紫外线传感器装置和制造CMOS兼容的紫外线传感器装置的方法

摘要

The ultraviolet sensor device comprises a semiconductor substrate, a dielectric layer above the substrate, a surface of the dielectric layer that is provided for the incidence of ultraviolet radiation, a floating gate electrode in the dielectric layer and an electrically conductive control gate electrode near the floating gate electrode. The control gate electrode is insulated from the floating gate electrode. A sensor layer is formed by an electrically conductive further layer that is electrically conductively connected to the floating gate electrode. The control gate electrode is arranged outside a region that is located between the sensor layer and the surface provided for the incidence of ultraviolet radiation. The sensor layer is discharged by incident UV radiation and can be charged or discharged electrically by charging or discharging the floating gate electrode.
机译:紫外线传感器装置包括半导体基板,在基板上方的介电层,被设置用于入射紫外线辐射的介电层的表面,介电层中的浮置栅电极以及在浮置附近的导电控制栅电极。栅电极。控制栅电极与浮置栅电极绝缘。传感器层由另一导电层形成,该另一导电层导电地连接至浮栅电极。控制栅电极布置在位于传感器层和为入射紫外线而设置的表面之间的区域之外。传感器层通过入射的紫外线辐射放电,并且可以通过对浮动栅电极进行充电或放电而进行充电或放电。

著录项

  • 公开/公告号US9577135B2

    专利类型

  • 公开/公告日2017-02-21

    原文格式PDF

  • 申请/专利权人 AMS AG;

    申请/专利号US201415028010

  • 发明设计人 FRIEDRICH PETER LEISENBERGER;

    申请日2014-09-30

  • 分类号H01L31/09;H01L31/0216;H01L31/113;H01L27/146;G01J1/42;H01L21/28;H01L21/3205;H01L27/115;H01L27/144;H01L29/49;H01L29/788;H01L31/18;

  • 国家 US

  • 入库时间 2022-08-21 13:43:30

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