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A device for non-invasive monitoring of the dielectric matrix flow during the RTM process

机译:用于在RTM过程中无创监控介电基质流量的设备

摘要

The device for non-invasive monitoring of the dielectric matrix flow during the RTM process is designed to eliminate problems with unsaturation of the dielectric matrix composite products or other defects caused by poor setting of the dielectric matrix inputs or outputs. The device uses the capacitance sensors (2) with a scattered electric field embedded in the wall of the mould (13) of the RTM process just below its working surface (3). The capacitance sensors (2) embedded this way change their electrical capacity on the basis of changes in the electrical permitivity of the surrounding environment. The essence of the invention then consists in developing a device which allows to process the measured signals from the capacitance sensors (2) with a sufficient distance of the useful signal from the noise and, consequently, to clearly display these signals. The device is designed wirelessly so as not to limit the RTM process operator during their work.
机译:RTM过程中用于非侵入性监控介电基质流量的设备旨在消除介电基质复合产品不饱和的问题或介电基质输入或输出设置不当引起的其他缺陷。该设备使用电容传感器(2),该传感器在RTM工艺的模具(13)壁中的工作表面(3)下方嵌入了散射电场。以这种方式嵌入的电容传感器(2)根据周围环境的电导率的变化来改变其电容。因此,本发明的实质在于开发一种设备,该设备允许以足够的有用信号与噪声之间的距离来处理来自电容传感器(2)的测量信号,从而清楚地显示这些信号。该设备是无线设计的,因此不会限制RTM流程操作员的工作。

著录项

  • 公开/公告号CZ306925B6

    专利类型

  • 公开/公告日2017-09-20

    原文格式PDF

  • 申请/专利权人 VÝZKUMNÝ A ZKUŠEBNÍ LETECKÝ ÚSTAV A.S.;

    申请/专利号CZ2014175

  • 发明设计人 JAN CAGÁŇ;

    申请日2014-03-24

  • 分类号G01N27/22;G01N33/44;G01N11/04;B29C45/76;

  • 国家 CZ

  • 入库时间 2022-08-21 13:39:31

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