首页> 外国专利> ION SOURCE LINER HAVING A LIP FOR ION IMPLANTION SYSTEMS

ION SOURCE LINER HAVING A LIP FOR ION IMPLANTION SYSTEMS

机译:离子源衬里有离子注入症状的唇

摘要

An ion source liner 204 comprises a plate having an exposure surface. The plate comprises a hole and a lip 234 surrounding the hole and extending outward from the exposure surface, and optionally a recess having a second surface recessed from the exposure surface and surrounding the hole. Further disclosed are an arc chamber 202, comprising said said ion source liner and an electrode 208 (e.g. a repeller 248) having a shaft 218 and a head 250, wherein the electrode passes though said hole and defines an annular gap 206 between the plate and the shaft; as well as an ion source comprising said arc chamber, wherein the arc chamber has body defining an interior region 212, in which said exposure surface is exposed to a plasma generated within said arc chamber, and wherein the electrode is electrically isolated from the body. The lip 234 generally prevents particulate contaminants 248' from entering the annular gap 206.
机译:离子源衬里204包括具有暴露表面的板。该板包括孔和围绕该孔并从暴露表面向外延伸的唇缘234,以及可选地具有第二表面的凹槽,该第二表面从暴露表面凹入并围绕该孔。还公开了一种电弧室202,其包括所述离子源衬套和具有轴218和头部250的电极208(例如推斥极248),其中电极穿过所述孔并在板和电极之间限定环形间隙206。轴以及包括所述电弧室的离子源,其中,所述电弧室具有限定内部区域212的主体,在所述内部区域中,所述暴露表面暴露于在所述电弧室内产生的等离子体,并且其中,所述电极与所述主体电隔离。唇缘234通常防止微粒污染物248'进入环形间隙206。

著录项

  • 公开/公告号WO2017079588A1

    专利类型

  • 公开/公告日2017-05-11

    原文格式PDF

  • 申请/专利权人 AXCELIS TECHNOLOGIES INC.;

    申请/专利号WO2016US60570

  • 发明设计人 COLVIN NEIL K.;HSIEH TSEH-JEN;

    申请日2016-11-04

  • 分类号H01J27/02;H01J37/08;H01J37/317;

  • 国家 WO

  • 入库时间 2022-08-21 13:31:09

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号