METHOD FOR PRODUCING PLANARIZATION FILM, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION FOR FORMING PLANARIZATION FILM, PLANARIZATION FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

摘要

Provided are: a method for producing a planarization film, which is capable of forming a planarization film having excellent planarization properties; an active light sensitive or radiation sensitive composition for forming a planarization film; a planarization film; and a method for manufacturing an electronic device. This method for producing a planarization film comprises: a step A for forming a film on a stepped substrate with use of a composition that contains a resin (A) and a photoacid generator (B); a step B for exposing the film to light through a mask that is arranged in a position corresponding to a projected part of the stepped substrate; and a step C for obtaining a planarization film by removing the film provided on the projected part of the stepped substrate with use of a developer liquid. In this connection, the γ value of a test film that is obtained using the above-described composition is less than 1,000.