METHOD FOR PRODUCING ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

The present invention addresses the problem of long-term stability and resolution.One embodiment of the present invention is a method for producing an active light sensitive or radiation sensitive resin composition containing a resin, an acid generator, an organic acid and a solvent, which is characterized by comprising a step selected from among the steps (i), (ii) and (iii) described below, and which is also characterized in that the content ratio of the organic acid in the active light sensitive or radiation sensitive resin composition is more than 5% by mass based on the total solid content in the composition.(i) a step for dissolving an organic acid in a solution that does not substantially contain a resin and an acid generator(ii) a step for dissolving an organic acid in a solution that contains an acid generator but does not substantially contain a resin(iii) a step for dissolving an organic acid in a solution that contains a resin but does not substantially contain an acid generator