SUBSTRATE POLISHING DEVICE, CLEANING METHOD FOR SAME, AND DEVICE FOR SUPPLYING LIQUID TO SUBSTRATE POLISHING DEVICE

摘要

Provided are a substrate polishing device, a method of cleaning the same, and a device for supplying liquid to a substrate polishing device, with which it is possible to suppress agglomeration of a polishing liquid in a pipe.Provided is a substrate polishing device equipped with: a polishing table; a nozzle capable of supplying a polishing liquid to the polishing table; a pipe communicating with the nozzle; and a switching device which switches between supplying the polishing liquid, a chemical solution and pure water to the pipe.