首页> 外国专利> BALANCE MASS SYSTEM SHARED BY WORKPIECE TABLE AND MASK TABLE AND LITHOGRAPHY MACHINE

BALANCE MASS SYSTEM SHARED BY WORKPIECE TABLE AND MASK TABLE AND LITHOGRAPHY MACHINE

机译:工作台,面罩和光刻机共享的平衡质量系统

摘要

The present invention relates to a balance mass system in which a workpiece table and a mask table are shared, comprising a first part (11) for installing a workpiece table system; A second portion (20) for installing a mask table system; And a third portion (14) for connecting the first portion (11) and the second portion (20), and a drift preventing and compensating device (16), wherein the first portion of the balancing mass Is supported to float on the base frame 1 of the exposure machine and the third part 14 of the balance mass is connected to the base frame 1 via the drift preventing and compensating device 16, (16) is installed close to the center of gravity position of the entire balance mass. The balance mass system saves the external holder of the mask table system, reduces the volume and weight of the exposure system, reduces the mass of the required balance mass, and makes the overall structure more compact.;
机译:平衡质量系统技术领域本发明涉及一种平衡质量系统,在该平衡质量系统中,工件工作台和掩模工作台共用,其包括用于安装工件工作台系统的第一部分(11);第二部分(20),用于安装口罩台系统;以及用于连接第一部分(11)和第二部分(20)的第三部分(14),以及防漂移和补偿装置(16),其中,平衡质量的第一部分被支撑为浮在基础框架上。曝光机的第一部分和平衡块的第三部分14通过防漂移和补偿装置16连接到基础框架1,(16)安装在靠近整个平衡块的重心位置的位置。平衡质量系统节省了掩模台系统的外部支架,减小了曝光系统的体积和重量,减少了所需平衡质量的质量,并使整体结构更加紧凑。

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