METHOD FOR COMPENSATING AN EXPOSURE ERROR IN AN EXPOSURE PROCESS

摘要

There is provided a method of compensating for an exposure error in an exposure process of a lithographic apparatus comprising a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation reaching a substrate level, - can be used to calculate the amount of IR radiation absorbed by the object at a point in time; And controlling the exposure process using a dose measurement to compensate for exposure errors associated with IR radiation absorbed by the object during the exposure process.