首页> 外国专利> VACUUM ARC VAPORIZATION SOURCE AND AN ARC VAPORIZATION CHAMBER WITH A VACUUM ARC VAPORIZATION SOURCE

VACUUM ARC VAPORIZATION SOURCE AND AN ARC VAPORIZATION CHAMBER WITH A VACUUM ARC VAPORIZATION SOURCE

机译:真空电弧气化源和带有真空电弧气化源的电弧气化室

摘要

The present invention is characterized in that it comprises a cathode body 3 having a ring-shaped magnetic field source 2 and a vaporizing material 31 as the cathode 32 for generating an arc discharge on the vaporizing surface 33 of the cathode 32 To a vacuum arc-welding source. In this arrangement, the cathode body 3 is axially bounded by the cathode base 34 in the first axis direction and axially bounded by the vaporization surface 33 in the second axis direction Wherein the ring-shaped magnetic field source (2) is arranged so as to have a polarity parallel to or not parallel to the normal line (300) of the vaporization surface (33) And are arranged concentrically. In accordance with the present invention, a magnetic field enhancing ring 4 is disposed at a predetermined second distance A2 ahead of the cathode base 34, away from the vaporization surface 33. The present invention also relates to an arc-firing chamber (10) having an arc-vaporizing source (1).
机译:本发明的特征在于,它包括具有环形磁场源2的阴极体3和作为阴极32的蒸发材料31,用于在阴极32的蒸发表面33上产生电弧放电。焊接源。在这种布置中,阴极体3在第一轴向上由阴极基座34轴向地界定,并且在第二轴向上被汽化表面33轴向地界定,其中环形磁场源(2)被布置为具有与汽化表面(33)的法线(300)平行或不平行的极性,并且同心布置。根据本发明,磁场增强环4被设置在阴极基部34之前,远离汽化表面33的预定第二距离A2处。本发明还涉及一种具有以下特征的引弧室(10):电弧蒸发源(1)。

著录项

  • 公开/公告号KR101698413B1

    专利类型

  • 公开/公告日2017-01-20

    原文格式PDF

  • 申请/专利权人 술저 메타플라스 게엠베하;

    申请/专利号KR20167007309

  • 发明设计人 베테르 요르그;

    申请日2008-03-11

  • 分类号H01J37/32;H01J37/305;

  • 国家 KR

  • 入库时间 2022-08-21 13:26:11

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