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VACUUM ARC VAPORIZATION SOURCE AND AN ARC VAPORIZATION CHAMBER WITH A VACUUM ARC VAPORIZATION SOURCE
VACUUM ARC VAPORIZATION SOURCE AND AN ARC VAPORIZATION CHAMBER WITH A VACUUM ARC VAPORIZATION SOURCE
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机译:真空电弧气化源和带有真空电弧气化源的电弧气化室
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摘要
The present invention is characterized in that it comprises a cathode body 3 having a ring-shaped magnetic field source 2 and a vaporizing material 31 as the cathode 32 for generating an arc discharge on the vaporizing surface 33 of the cathode 32 To a vacuum arc-welding source. In this arrangement, the cathode body 3 is axially bounded by the cathode base 34 in the first axis direction and axially bounded by the vaporization surface 33 in the second axis direction Wherein the ring-shaped magnetic field source (2) is arranged so as to have a polarity parallel to or not parallel to the normal line (300) of the vaporization surface (33) And are arranged concentrically. In accordance with the present invention, a magnetic field enhancing ring 4 is disposed at a predetermined second distance A2 ahead of the cathode base 34, away from the vaporization surface 33. The present invention also relates to an arc-firing chamber (10) having an arc-vaporizing source (1).
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