METHOD OF SLIMMING RADIATION-SENSITIVE MATERIAL LINES IN LITHOGRAPHIC APPLICATIONS

摘要

Methods and systems for patterning a substrate using a radiation sensitive material are described herein. The method 500 and the system may include forming a layer of a radiation-sensitive material on a substrate 510, exposing the layer of radiation-sensitive material to a pattern of radiation 520, Includes (530) to do. Thereafter, a positive tone development is performed on the layer of the image-wise radiation-sensitive material so as to form a radiation-sensitive material line by removing the region having a high radiation exposure amount (540). Thereafter, the temperature gradient in the radiation sensitive material line is removed (550) and the radiation sensitive material line is then slimmed (560).;