APPARATUS FOR SUPPLYING POWER VOLTAGE DATA CALIBRATION METHOD AND APPARATUS FOR TREATING SUBSTRATE EMPLOYING THE SAME

摘要

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a power supply device, a voltage data calibration method, and a substrate processing apparatus using the same, for calibrating voltage data as a reference for determining a high-frequency power value supplied to a chamber, thereby improving accuracy. A power supply apparatus according to an embodiment of the present invention includes: a high frequency power supply for providing a high frequency power; A chamber including a plasma source for generating plasma using the high frequency power; A sensor connected between the high frequency power source and the chamber to measure a voltage; A memory for storing preset reference radio frequency power and corresponding voltage data; And a controller for calibrating voltage data stored in the memory based on the voltage measured by the sensor.;