ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM MASK BLANKS INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM PATTERN FORMING METHOD AND PHOTOMASK

摘要

An actinic ray or an actinic ray sense comprising a compound (A) generating an acid by irradiation with radiation or the radiation-sensitive property as a resin composition; The acid via a covalent bond to a sense that groups connections represented by formula (M) an actinic ray or last radiation-sensitive resin composition. [Wherein, Y ₁ and Y ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * Denotes a connection portion of the residue and the compound (A)]