Apparatus and method for the manufacture of a free-standing polycrystalline diamond film deposition (cvd) -

摘要

In a system and a method for growing a diamond film, a cooling gas flows between a substrate and a substrate holder a plasma chamber, and a process gas flows into the plasma chamber. In the presence of plasma in the plasma chamber, a temperature distribution on the upper surface of the substrate and / or on a growth of the surface of the growing diamond film is controlled, wherein during the diamond film culturing the temperature distribution is controlled to a predefined temperature difference between the highest temperature and the lowest temperature of the temperature distribution have. The thus grown diamond film has a total thickness variation (term ttv) of 10%, & 5% or & 1%; and / or a birefringence of 0 to 100 nm / cm, 0 to 80 nm / cm, 0 to 60 nm / cm, 0 to 40 nm / cm, 0 to 20 nm / cm, 0 to 10 nm / cm or 0 to 5 nm / cm.