MOBILE UNIT SYSTEM, PATTERN FORMING DEVICE, EXPOSING DEVICE, EXPOSING METHOD, AND DEVICE MANUFACTURING METHOD

摘要

A laser beam (Ly1, Ly2 and the like) emitted by an encoder main body (16Ya, 16Yb and the like) enters a wafer table (WTB) via a PBS (18) from the outside, and reaches a grating (24) at a point (IAa) that is located right under exposure area (IA), and is diffracted by the grating. Then, by receiving interference light of a first polarized component that has returned from the grating and a second polarized component reflected by the PBS, positional information of the wafer table is measured. Accordingly, because the first polarized component, which has passed through PBS passes through the wafer table until it is synthesized with the second polarized component again, does not proceed through the atmosphere outside, position measurement of the wafer table can be performed with high precision without the measurement beam being affected by the fluctuation of the atmosphere around the wafer table.