PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICRO-LITHOGRAPHIC IMAGING

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method which enable a lateral position measurement on a wafer or a reticle with an adequate degree of complexity in shorter time.SOLUTION: A projection exposure tool (10) for micro-lithography for imaging mask structures (22) of an image-providing substrate (20) on a substrate (30) to be structured includes a measuring apparatus (40) configured to determine a relative position of measurement structures (32) disposed on a surface of one of the substrates (20; 30) in relation to one another in at least one lateral direction with respect to a substrate surface and to thereby simultaneously measure a number of measurement structures (32) disposed laterally offset in relation to one another.SELECTED DRAWING: Figure 1