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Projection exposure tool for microlithography and method of microlithography imaging
Projection exposure tool for microlithography and method of microlithography imaging
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机译:用于微光刻的投影曝光工具和微光刻成像的方法
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摘要
A projection exposure tool for microlithography for imaging mask structures of an image-providing substrate onto a substrate to be structured includes a measuring apparatus configured to determine a relative position of measurement structures disposed on a surface of one of the substrates in relation to one another in at least one lateral direction with respect to the substrate surface and to thereby simultaneously measure a number of measurement structures disposed laterally offset in relation to one another.
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