IMAGING OPTICAL SYSTEM PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY COMPRISING AN IMAGING OPTICAL SYSTEM OF THIS TYPE AND METHOD FOR PRODUCING A MICROSTRUCTURED COMPONENT WITH A PROJECTION EXPOSURE INSTALLATION OF THIS TYPE

摘要

image-forming optical system (8), as only one embodiment of a beam guiding elements It has the mirror. The image-forming optical system 8 is imaged in at least one of the image field (9, 10) in the at least one object field (4, 5), at least one image plane (11) in at least one of the object plane (6) The. In the image-forming optical system (8), spatially separated from one another, as there are two object fields (4, 5) associated with the two image fields (9, 10) are spatially separated from one another. As a result, the flexibility of using the image-forming optical system is increased.