IMAGING OPTICAL SYSTEM, PROJECTION EXPOSURE INSTALLATION FOR MICRO-LITHOGRAPHY COMPRISING AN IMAGING OPTICAL SYSTEM OF THIS TYPE, AND METHOD FOR PRODUCING A MICROSTRUCTURED COMPONENT WITH A PROJECTION EXPOSURE INSTALLATION OF THIS TYPE

摘要

One embodiment of an imaging optical system (8) has exclusively mirrors as beam-guiding optical components. The imaging optical system (8) images at least one object field (4, 5) in at least one object plane (6) into at least one image field (9, 10) in at least one image plane (11). In the imaging optical system (8), there are two object fields (4, 5) which are spatially separated from one another and with which two image fields (9, 10), which are likewise spatially separated from one another, are associated. This resuits in an imaging optical system with increased flexibility of use.